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Physics and Astronomy Classification Scheme 1999
52.75.-d
Plasma devices and applications (see also 28.52 Fusion reactors; for ion sources, see 29.25.L, N; for plasma sources, see 52.50.D)
( 0 Dok. )
52.75.Di
Accelerators and propulsion
( 0 Dok. )
52.75.Fk
Magnetohydrodynamic generators and thermionic convertors; plasma diodes (see also 84.60.L, N in direct energy conversion and storage)
( 0 Dok. )
52.75.Hn
Plasma torches
( 0 Dok. )
52.75.Kq
Plasma switches (e.g., spark gaps)
( 0 Dok. )
52.75.Ms
Free-electron devices (for free-electron lasers, see 41.60.C)
( 0 Dok. )
52.75.Pv
High-voltage diodes (for high-current and high-voltage technology, see 84.70)
( 0 Dok. )
52.75.Rx
Plasma applications in manufacturing and materials processing (etching, surface cleaning, spraying, arc welding, ion implantation, film deposition, etc.)
( 0 Dok. )
52.75.Va
Devices for generation of coherent radiation
( 0 Dok. )
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Letzte Änderung: 10. Nov. 2010